Researcher in Novel Materials for Future High-performance Logic What you will do The scaling roadmap of logic technologies continues to evolve, creating opportunities for materials beyond silicon. Among the most promising candidates are two-dimensional semiconductors and
Etch Expert for Sustainable Technologies Background The manufacturing of integrated circuits (ICs) is one of the most technologically advanced industrial activities in the world, involving hundreds to thousands of tightly controlled process steps and the consumption
Postdoc Researcher Dry Etch for 2D and 1D materials Background Low dimensionality materials, like transition metal dichalcogenides (TMDCs, 2D) or single-walled carbon nanotubes (SWCNTs, 1D) are driving attention in view of their superior transport properties, which
R&D Engineer Patterning Materials What you will do You will be a member of the (EUV) Patterning Materials team, part of the Advanced Patterning department, responsible for development of EUV patterning materials. You will facilitate projects
The dsm-firmenich site in Louvain-la-Neuve, Belgium, is a leading innovation and manufacturing hub where science, creativity, and technology come together to shape the future of food and beverage experiences. With a strong focus on quality, safety,
About GF GlobalFoundries® Inc. (GF®) is one of the worlds leading semiconductor manufacturers. GF redefines innovation and semiconductor manufacturing by developing and delivering feature-rich process technology solutions with leading performance in all growth markets. GF offers
About GF GlobalFoundries® Inc. (GF®) is one of the worlds leading semiconductor manufacturers. GF redefines innovation and semiconductor manufacturing by developing and delivering feature-rich process technology solutions with leading performance in all growth markets. GF offers
For our office in Leuven, we are looking for highly qualified and motivated professionals like you. If you think you have what it takes to keep Septentrio firmly in Pole Position, get in touch. We need