Dry etch R&D Engineer Advanced Patterning Background Pitch scaling is one of the fundamental driver for semiconductor device performance improvement. To print smaller feature size, Extreme Ultraviolet (EUV) lithography has been introduced. Additionally, multipatterning schemes are employed
R&D Team Leader Dry Etch What you will do As an R&D Team Leader within the Dry Etch Process Development organization, you will lead a team of talented engineers developing next-generation plasma etch solutions for advanced
Lithography Process Development Assistant What you will do As a Lithography Process Development Assistant, you will be a member of the Process Efficiency Team, part of the Advanced Patterning Department. This department is responsible for material screening